Cleanroom Components Analyzer Gas Purifier Gas Cylinder Cabinet Chemical Filter Gas Filter

Gas Filter

Applications

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Product Specifications

Schematic picture	Product series	Flow range	Filtering accuracy	Core filter material	Applicable scenarios	Benchmarking international competing products
	HPC-M	0~60slpm	≥0.003μm	Double layer hydrophobic PTFE membrane	Ultra-high purity process gas (such as He carrier gas for photoresist coating, etching process reaction gas)	Entegris Wafergard® II F Micro
	HPC-ML	0~120slpm	≥0.003μm	Double layer hydrophobic PTFE membrane	Medium to high flow process gases (such as physical vapor deposition PVD, chemical vapor deposition CVD process gases)	Pall Gaskleen® Light Series
	HPC-N	0~600slpm	≥0.003μm	PTFE filter membrane	Bulk gases (such as dry compressed air, nitrogen purge gas, instrument gas)	Entegris Linegard™ MAX-FP
	HPC-B	0~1000slpm	≥0.003μm	Perfluorinated inner core + PTFE filter membrane	High impurity process gas (such as ion implantation process gas, diffusion furnace protective gas)	Pall Gaskleen® V Series
	HPC-Z	0~3000slpm	≥0.003μm	PTFE / perfluorinated core (optional)	Ultra-large flow bulk gas (such as centralized supply of nitrogen and hydrogen main pipelines in semiconductor factories)	Entegris Linegard™ GIGAX-FP

Core Advantages

Performance Comparable to Imported Products, Seamless Replacement

The product dimensions and interface types (VCR / SWG / Butt Weld / C-seal, etc.) are fully consistent with similar products from Entegris and Pall, requiring no modifications to existing piping during installation. The replacement cycle is shortened from 7–10 days for imported products to 1–2 days, minimizing production line downtime losses.

Low Resistance, High Flow Rate, Energy Saving

The innovative filter membrane design features a 15% larger filtration area in the HPC-M series compared to the Entegris Wafergard? II F Micro. At the same flow rate (60 slpm), the pressure drop is 0.05 MPa lower than that of imported products. This can reduce energy consumption of auxiliary equipment such as air compressors by approximately 8% to 10% annually.

High-Cleanliness Delivery and Quick Start-Up

All products in the series are assembled, tested, and packaged in a Class 10,000 cleanroom (ISO Class 7). Each unit undergoes 100% integrity testing to ensure the filter membrane is intact, as well as 100% helium mass spectrometer leak testing before shipment. After installation, customers only need a 30-minute quick purge before the system is ready for operation—saving 75% of start-up time compared to imported products, which typically require 2 to 4 hours of purging.

Chemical Resistance and Media Compatibility

Highly chemical-resistant and compatible with all media. The filter membrane (PTFE), center rod (PFA), and O-ring (TEV) are all made of perfluorinated materials, offering excellent resistance to acids, alkalis, and organic solvents. They are compatible with all process gases used in the semiconductor industry, including corrosive gases such as HCl and NH?, as well as flammable gases like SiH?. There is no need to change filters for different media, reducing equipment management costs.

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Worry-free production

Intelligent design reduces safety risks.

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